Planar magnetron sputtering device with eccentric

2022-08-08
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The utility model relates to a planar magnetron sputtering device with eccentric axis rotation of ITO coated glass, which is characterized in that it includes: ITO target (2), oxygen free copper plate (3), permanent experimental magnet (4), magnet base (5), and The oxygen free copper plate (3) is fixed on the inner side of the target seat (6), the ITO target (2) is welded and fixed on the inner side of the oxygen free copper plate (3), the magnet base (5) is arranged in the target seat (6) and arranged in parallel with the oxygen free copper plate (3), and the permanent magnet (4) is fixed on the inner side of the magnet base (5), The bearing seat (10) is fixed on the outside of the magnet base (5), the bearing (11) is placed in the bearing seat (10), the shaft seat (7) is fixed on the outside of the target seat (6), the inner end of the eccentric shaft (9) is eccentrically connected to the bearing seat (10) through the bearing (11), and the middle passes through the shaft seat (7). 2. Functional characteristics of the spring tension compression fatigue testing machine. The central groove etched by the new target is widened by the wire and cable sample, which is a qualified product. The utilization rate of the target reaches 60% - 70%, which is three times that of the original

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